Te-Co 63163 Delrin Holder for Magnetic Vee Standoffs, 19.50 mm Inside Diameter, 35.00 mm Outside Diameter, 15.80 mm Internal Depth, 32.00 mm Height, Use With 63142

# Te-Co Delrin Holder for Magnetic Vee Standoffs The Te-Co 63163 Delrin Holder is a precision-engineered component designed to enhance the functionality of magnetic vee standoffs in machining applications. This robust holder is crafted to provide reliable support and stability, ensuring optimal performance in a variety of manufacturing settings. ## Key Features • **Inside Diameter:** 19.50 mm – Perfectly sized to fit snugly with magnetic vee standoffs, providing a secure hold. • **Outside Diameter:** 35.00 mm – Offers a broader base for improved stability during machining operations. • **Internal Depth:** 15.80 mm – Allows for effective integration with various tooling components. • **Height:** 32.00 mm – Designed to accommodate different machining setups while maintaining a compact profile. • **Material:** Made of high-quality Delrin, known for its excellent resistance to wear and chemical exposure, ensuring durability and longevity. ## Applications • **Machining Operations:** Ideal for use in precision machining applications across various industries including automotive, aerospace, and medical. • **Compatibility:** Specifically designed for use with Te-Co's 63142 magnetic vee standoffs, enhancing the overall efficiency of your workholding setup. • **Industrial Use:** Suitable for both small machine shops and large-scale manufacturing facilities, adapting to diverse operational needs. ## Benefits • **Enhanced Stability:** The design and material of the holder contribute to superior stability and reduced vibration during machining processes. • **Durability:** Constructed from Delrin, this holder withstands harsh industrial environments, ensuring long-lasting performance. • **Improved Efficiency:** By providing a secure fit for magnetic standoffs, this holder helps streamline machining workflows and increases productivity. --- *Product information compiled with AI assistance for reference purposes.*